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VA-3200 Wafer Image Inspection System

The VA-3200 wafer imaging inspection system is an efficient and accurate tool designed to replace traditional IQC manual visual inspection and is specifically designed to identify defects on the wafer surface.

Describe Details

【Features】
• Prober compatibility: The VA-3200 image inspection system is designed to be mounted on a probe machine, allowing engineers and operators to use it in a familiar equipment environment.
• Simplify the operation process: The integration of the system and the needle test machine allows users to use the existing operation interface to set image parameters, reducing the learning curve for the new system.
• Avoid the risk of wafer breakage: Since there is no need to directly contact the wafer for picking and placing, the risk of wafer breakage is effectively prevented.
• Improved operational convenience: Engineers and operators who are familiar with needle testing machines can get started more easily, maintaining the efficiency and safety of the inspection process.

【Product advantages】
1. High-quality image capture
◦ Line Scan Camera: Using a line scan camera, it provides a large field of view (FOV) and fast scanning capabilities, and can completely capture the image of the entire wafer in a short time.
◦ 3x lens: Used with a high-magnification lens, it can produce high-quality images and significantly improve the recognition rate of defect features.
2. High-precision defect detection
◦ Detection accuracy reaches 5μm: It has high-precision detection capabilities and can accurately identify tiny defects on the wafer surface, including foreign objects (Particles), scratches (Scratches), Pad anomalies and Bump anomalies.


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